Studies and Research on the Production of TiO2 and TiN Thin Films by Assisted Physical Vapor Deposition Magnetron Process
Abstract
The experimental research carried out in this paper aims at obtaining thin films of TiO2 and TiN and at characterizing them in terms of morphology, structure, transparency and electrical properties. The films were obtained using a PVD device of sputtering coating, consisting of a vacuum chamber with a capacity of 2 liters, a planar magnetron with ferrite magnets (ɸ40 x 22 x 9), neodymium (ɸ15 x 8), a vacuum pump with sliding blades, a variable DC source voltage of 100-600 volts. The atmosphere used to maintain the plasma during deposition was oxygen and then N2 rarefied within a pressure range between 3·10-2-8·10-3 mbar at a flow rate of 1.4 cm3 min. It was found that the structures and properties of the films are influenced by the parameters used and their color depends on the working atmosphere, the deposition parameters and the layer stoichiometry.
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References
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