Studies and Research on Obtaining Multifunctional Thin Films by Magnetron-Assisted PVD Process
Keywords:
thin films, d.c. magnetron, electrical and optical properties
Abstract
The paper aims to obtain thin films of nickel and zinc through the magnetron-assisted spraying process and their characterization from a structural point of view, of electrical, optical properties and corrosion resistance. It was found that as the intensity and discharge power increase, changes occur in the structure and properties of the deposited films.
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References
[1]. Vermeşan G., et al., Introduction to surface engineering, Dacia publishing house, Cluj-Napoca, 1999 (Introducere în ingineria suprafeţelor, editura Dacia, Cluj-Napoca, 1999).
[2]. Maria Constantinescu, Corrosion protection of metals, Technical Publishing House, Bucharest, 1979. (Protecţia anticorozivă a metalelor, Editura Tehnică, Bucureşti, 1979).
[3]. Marinescu A, Andonianţ Gh., E Bay – Electrochemical and chemical technologies for the protection of metallic materials, Bucharest Technical Publishing House, 1984 (Tehnologii electrochimice şi chimice de protectie a materialelor metalice, Editura Tehnica Bucureşti, 1984).
[4]. Schumann H., Physical Metallurgy, Technical Publishing House, 1962 (Metalurgie fizică, Editura tehnică, 1962).
[5]. Mech K., Kowalik R., Zabiński P., Cu thin films deposited by dc magnetron sputtering for contact surfaces on electronic components, Archives of Metallurgy and Materials, Issue 4, vol. 56, 2011.
[6]. Minh-Tung Le, Yong-Un Sohn, Jae-Won Lim, Good-Sun Choi, Effect of Sputtering Power on the Nucleation and Growth of Cu Films Deposited by Magnetron Sputtering, Materials Transactions, vol. 51, No. 1, p. 116-120, 2010.
[7]. Ali Gelali, Azin Ahmadpourian, Shahoo Valedbagi, Behroz Safibonab, Bandar Astinchap, Eisa Karimzadeh, Structure and Morphology of the Cu Films Grown by DC Magnetron Sputtering, J. Basic. Appl. Sci. Res., 3(6), p. 846-849, 2013.
[8]. Boiciuc S., CuO films obtained by oxidation of cu layers deposited by the pvd process - magnetron sputtering, The Annals of “Dunarea de Jos” University of Galati, Fascicle IX. Metallurgy and Materials Science, no. 3, 2020.
[2]. Maria Constantinescu, Corrosion protection of metals, Technical Publishing House, Bucharest, 1979. (Protecţia anticorozivă a metalelor, Editura Tehnică, Bucureşti, 1979).
[3]. Marinescu A, Andonianţ Gh., E Bay – Electrochemical and chemical technologies for the protection of metallic materials, Bucharest Technical Publishing House, 1984 (Tehnologii electrochimice şi chimice de protectie a materialelor metalice, Editura Tehnica Bucureşti, 1984).
[4]. Schumann H., Physical Metallurgy, Technical Publishing House, 1962 (Metalurgie fizică, Editura tehnică, 1962).
[5]. Mech K., Kowalik R., Zabiński P., Cu thin films deposited by dc magnetron sputtering for contact surfaces on electronic components, Archives of Metallurgy and Materials, Issue 4, vol. 56, 2011.
[6]. Minh-Tung Le, Yong-Un Sohn, Jae-Won Lim, Good-Sun Choi, Effect of Sputtering Power on the Nucleation and Growth of Cu Films Deposited by Magnetron Sputtering, Materials Transactions, vol. 51, No. 1, p. 116-120, 2010.
[7]. Ali Gelali, Azin Ahmadpourian, Shahoo Valedbagi, Behroz Safibonab, Bandar Astinchap, Eisa Karimzadeh, Structure and Morphology of the Cu Films Grown by DC Magnetron Sputtering, J. Basic. Appl. Sci. Res., 3(6), p. 846-849, 2013.
[8]. Boiciuc S., CuO films obtained by oxidation of cu layers deposited by the pvd process - magnetron sputtering, The Annals of “Dunarea de Jos” University of Galati, Fascicle IX. Metallurgy and Materials Science, no. 3, 2020.
Published
2021-09-15
How to Cite
1.
BOICIUC S. Studies and Research on Obtaining Multifunctional Thin Films by Magnetron-Assisted PVD Process. The Annals of “Dunarea de Jos” University of Galati. Fascicle IX, Metallurgy and Materials Science [Internet]. 15Sep.2021 [cited 30Oct.2024];44(3):22-6. Available from: https://gup.ugal.ro/ugaljournals/index.php/mms/article/view/4870
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